Information for "Plasma-enhanced chemical vapor deposition"
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Basic information
| Display title | Plasma-enhanced chemical vapor deposition |
| Default sort key | Plasma-enhanced chemical vapor deposition |
| Page length (in bytes) | 12,065 |
| Namespace ID | 0 |
| Page ID | 7498205 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 8 |
| Counted as a content page | Yes |
| The Right Wiki item ID | None |
Page protection
| Edit | Allow all users (infinite) |
| Move | Allow all users (infinite) |
Edit history
| Page creator | imported>Dough34 |
| Date of page creation | 11:54, 22 September 2024 |
| Latest editor | imported>Dough34 |
| Date of latest edit | 11:54, 22 September 2024 |
| Total number of edits | 1 |
| Total number of distinct authors | 1 |
| Recent number of edits (within past 1 day) | 0 |
| Recent number of distinct authors | 0 |